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Metal Plasma Coater "AT-ET" [Produces Conductive Thin Films!]

Create conductive thin films with space-saving and low cost! Ideal for coating metal films during electron microscope observation!

The metal plasma coater "AT-ET" is a device for producing conductive thin films such as Au (gold), Ag (silver), and Pt (platinum) to prevent charging of samples during electron microscopy observation. By integrating a rotary pump into the main unit, it allows for space-saving installation. The vacuum level is displayed in an easy-to-read digital format, and with just one button, it can automatically perform the entire process from evacuation to coating to completion (standard processing time of about 5 minutes), making it a compact coater specifically designed for metal thin film production with simple operation. 【Features】 ■ Built-in rotary pump ■ Compact desktop size ■ Easy operation ■ Clear digital display *For more details, please request materials or view the PDF data available for download.